GEW phases out RHINO infrastructure with new EOS power platform at LOUPE Americas

A major shift in UV curing infrastructure

The UV curing landscape is undergoing a significant hardware and software transition this September. At LOUPE Americas 2026 in Chicago, UK-based manufacturer GEW officially retired its long-standing RHINO power infrastructure, replacing it entirely with the new EOS Power and Control Platform. Showcased at Booth 3500, this launch is not a mere iterative update but a ground-up redesign of power supplies, control electronics, cabling, and system software.

For converters and printers relying on consistent UV curing for labels, flexible packaging, and narrow web applications, the shift to EOS signals a deeper integration of telemetry into daily operations. The legacy RHINO system served the industry reliably for years, but the demands of modern print floors in 2026 require a different level of digital connectivity and data processing.

Intelligent hardware and OEM integration

The EOS platform introduces intelligent, serialized lampheads. This hardware change allows for precise tracking and seamless integration with Original Equipment Manufacturers (OEMs), moving away from reactive maintenance to a more predictive model. Standard features now include hour and reflector counters, alongside enhanced remote monitoring capabilities.

Security and data integrity have also taken center stage in this release. EOS incorporates end-to-end encryption for all communications traffic within the system. In an era where print floors are increasingly connected to broader enterprise networks and cloud-based analytics platforms, securing machine-level data is no longer optional. Protecting operational data from external vulnerabilities is a critical step forward for industrial printing equipment.

Robert Rae, Managing Director at GEW, noted the strategic importance of this launch. According to Rae, the connectivity of EOS allows for a wider variety of control and I/O options, generating the telemetry required for advanced production analysis and delivering a more ergonomic operator experience.

Maintaining ArcLED compatibility

Crucially for existing GEW customers, the EOS platform maintains full compatibility with the company’s patented ArcLED technology. This interchangeable system allows converters to switch between traditional mercury arc and energy-efficient LED curing without overhauling the entire press infrastructure. By manufacturing the EOS system in-house, GEW retains tight quality control over the supply chain—a critical factor given the electronic component shortages that have periodically disrupted the printing machinery sector in recent years.

Beyond the core power platform, GEW used the Chicago event to expand its peripheral control systems. The company introduced the DoseGuard precision control system and a new Air Blast Cooler. These additions reflect a broader industry push toward tighter process control, ensuring that UV output remains consistent across long runs and varying substrates, while effectively managing the thermal impact on heat-sensitive materials.

The transition to EOS is a smart, necessary evolution for GEW, proving that the future of UV curing lies just as much in software encryption and data telemetry as it does in raw lamp power. Will the rest of the UV curing market follow suit and standardize end-to-end encryption at the machine level before the end of the decade?

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